基片上二元组份薄膜的定量分析的Monte Carlo模拟计算方法
The Monte Carlo Simulation Method for Quantitative Analysis of a Binary Film on a Substrate
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摘要: 本文用Monte Carlo方法对入射电子在薄膜中的散射和特征X射线的发射进行数学模拟, 提出了基片上 二元组份薄膜成份的模拟计算方法, 用这一方法模拟计算了若干个二元组份薄膜的成份, 得到了与实验测定值相一致的模拟计算结果。Abstract: In this paper the Monte Carlo method is utilized to simulate incident electron scattering and characteristic x-ray emission in a film, and a calculation method of the composition of a binary film on a substrate is proposed. Calculations for several films are made, and agreement with measured values is obtained.